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Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock ranging from atmosphere to 0

SKU: 86348980390

4.1
EUR216.00 EUR246.00

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Ships within 48 hours · Estimated delivery Aug 9 - Aug 14

Live Spec

Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock ranging from atmosphere to 0The Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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Description

ranging from atmosphere to 0

Please see technical notes for properties

Desiccant weight is 46g

5mm and 1mm

lenses and delicate instruments

Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock ranging from atmosphere to 0The Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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